System of fabricating plane parallel substrates with uniform optical paths
US6639682B2 · kind B2 · utility
8Cited by
11References
39Claims
0Family size
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Key dates
| Filing date | Jun 1, 2001 |
| Grant date | Oct 28, 2003 |
| Priority date | — |
| Expiry date | Jun 1, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0625
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Process and apparatus for automated production of optical devices comprising two plane parallel optical surfaces of a desired optical performance for transmitted light, by measuring and quantifying the spectral response of intensity versus wavelength across the working surface area of a starter optical device as compared to an acceptable computer model, as a three dimensional contour map of optical thickness based on the assumption of a constant index of refraction, then reducing the high spots by automated means such as polishing, and measuring the spectral response again.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.