METHOD OF AND APPARATUS FOR REAL-TIME CONTINUAL NANOMETER SCALE POSITION MEASUREMENT BY BEAM PROBING AS BY LASER BEAMS AND THE LIKE OF ATOMIC AND OTHER UNDULATING SURFACES SUCH AS GRATINGS OR THE LIKE RELATIVELY MOVING WITH RESPECT TO THE PROBING BEAMS
US6639686B1 · kind B1 · utility
72Cited by
4References
28Claims
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Key dates
| Filing date | Apr 13, 2000 |
| Grant date | Oct 28, 2003 |
| Priority date | — |
| Expiry date | Apr 13, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01Q60/22
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An improved method of and apparatus for real-time continual nanometer scale position measurement by beam probing as by laser beams and the like, both fixed and oscillating or scanning, over an atomic and other undulating surface such as gratings or the like, relatively moving with respect to the probing beams; and providing, where desired, increased detection speeds, improved positioning sensing response, freedom from or relaxed requirements of strict control on probing oscillation amplitude, and multi-dimensional position measurement with focused beam probes and the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.