Transparent conductive film and process for producing the film
US6641937B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 9, 2000 |
| Grant date | Nov 4, 2003 |
| Priority date | — |
| Expiry date | Feb 6, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K2323/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention is for a transparent conductive film of nitrogen-containing indium tin oxide 5 nm to 100 &mgr;m thick formed on a substrate. The process for producing the transparent film includes exciting the surface of the substrate in a vacuum and depositing vaporized indium tin oxide on the surface of the substrate. The surface may be excited with irradiation with an ion beam. The indium tin oxide may be deposited through vacuum deposition, laser abrasion, ion plating, ion beam deposition, or chemical vapor deposition. Vapor deposition of indium tin oxide may be performed using a sintered product of indium oxide and tin oxide or with indium metal and tin metal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.