Electrophotosensitive material, production method of the same and method for inspecting an intermediary of the same
US6641968B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 22, 2002 |
| Grant date | Nov 4, 2003 |
| Priority date | — |
| Expiry date | Mar 22, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G5/142
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to an electrophotosensitive material comprising an intermediate layer formed between a conductive substrate and a photosensitive layer, and featuring heat treatment conditions for forming the intermediate layer defined such that a ratio A2/A1 between absorbances at two measurement wavelengths determined from a visible absorption spectrum of the intermediate layer is not more than a value of an intersection of a first approximation line and a second approximation line given by a correlation distribution between the absorbance ratio and the residual potential of the photosensitive material, the first approximation line representing little change of the residual potential despite the increase of the ratio A2/A1, the second approximation line representing a proportional increase of the residual potential with increase of the ratio A2/A1. The invention provides the electrophotosensitive material free from the variations of residual potential.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.