Patent · US Expired

Process of fabricating flip chip interconnection structure

US6642079B1 · kind B1 · utility

27Cited by
8References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 1, 2002
Grant dateNov 4, 2003
Priority date
Expiry dateOct 1, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/014
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

In a process of fabricating flip chip interconnection, a UBM layer is deposited on an I/O pad of a chip. The UBM layer includes a nickel layer. On the UBM layer is formed a tin-containing solder material. The chip is mounted on a carrier substrate by alignment of the bonding pad with a contact pad of the carrier substrate. A reflow process is performed to respectively turn the tin-containing solder material to a tin-containing solder bump and form a composite intermetallic compound on the nickel layer of the UBM to prevent its spalling.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.