Patent · US Expired

Hollow cylindrical cathode sputtering target and process for producing it

US6645358B2 · kind B2 · utility

11Cited by

4References

32Claims

0Family size

Assignee

W.C. Heraeus GmbH & Co. KG · DE

Inventors

David Francis Lupton · Gelnhausen, DE
Ralf Heck · Hanau, DE
Bernd Stenger · Hammersbach, DE
Oliver Warkentin · Pfungstadt, DE

Key dates

Filing date	Jan 15, 2002
Grant date	Nov 11, 2003
Priority date	—
Expiry date	Jan 15, 2022

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/342
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder is disclosed. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.