Reactor for plasma assisted gas processing
US6645441B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 27, 2001 |
| Grant date | Nov 11, 2003 |
| Priority date | — |
| Expiry date | Jul 27, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T10/12
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A reactor for the plasma-assisted processing of gaseous media comprising a reactor chamber including a gas permeable bed of active material, a power source for applying across the bed of active material a potential sufficient to establish a plasma in a gaseous medium flowing through the bed of active material and a chamber having an inlet stub and an outlet stub for constraining the gaseous medium to flow through the bed of active material, wherein the bed of active material comprises a matrix of beads of a dielectric material having an assembly of regular arrays of beads in each of which adjacent beads are connected to a high voltage input terminal or an electrical ground.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.