Gas inlet for an ion source
US6646253B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 17, 2000 |
| Grant date | Nov 11, 2003 |
| Priority date | — |
| Expiry date | May 24, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/0468
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a gas inlet structure for an ion source, including a capillary for the admission of a sample gas, which capillary is disposed in a guide tube for discharging a sample gas into the guide tube, the guide tube has an open end disposed in the ion source. The guide tube includes a valve for the pulsed admission of a carrier gas to the guide tube. The guide tube, the valve and the capillary are supported in a sealed support housing from which the guide tube with the capillary disposed therein projects into the ion source for supplying thereto the sample gas in a pulsed manner.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.