Apparatus and method providing substantially two-dimensionally uniform irradiation
US6649921B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 19, 2002 |
| Grant date | Nov 18, 2003 |
| Priority date | — |
| Expiry date | Aug 19, 2022 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61N2005/0665
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Apparatus and method providing substantially two-dimensionally uniform irradiation of a planar target surface. An irradiation source is within an elliptical reflecting trough, on the major axis of the trough, and spaced from the focal axes of the trough. Edges of the trough define a first plane substantially perpendicular to the major axis of the trough. Reflectors extend substantially equal distances from the longitudinal edges and the ends of the trough to define a target surface plane substantially parallel with the first plane. A translucent reflector is a positioned on the major axis of the trough, outside the trough. The translucent reflector has a first planar portion lying in a plane substantially parallel with the target surface plane, and second and third planar portions extending from the edges of the first planar portion and angled toward the target surface plane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.