Electron-source array and manufacturing method thereof as well as driving method for electron-source array
US6650061B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 28, 2000 |
| Grant date | Nov 18, 2003 |
| Priority date | — |
| Expiry date | Jul 28, 2020 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y10/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The electron-source array of the present invention is provided with cathode electrodes placed on an insulation substrate in the form of lines; and gate electrodes that are placed face to face with the cathode electrodes with the insulation film being interpolated in between. In this arrangement, the cathode electrodes and the gate electrodes are arranged so as to intersect each other with a pore being formed at an intersecting portion between each cathode electrode and each gate electrode in a manner so as to penetrate the insulation film, and the pore is filled with a conductive material or a semiconductive material with the material being electrically connected to the corresponding cathode electrode, and is formed in a manner so as to separate from the gate electrodes with a space in between. Thus, it becomes possible to form very fine emitters uniformly without the need for a high-precision patterning technique and consequently to provide an electron-source array that enables an X-Y matrix driving process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.