System configured for applying multiple modifying agents to a substrate
US6652654B1 · kind B1 · utility
17Cited by
6References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2000 |
| Grant date | Nov 25, 2003 |
| Priority date | — |
| Expiry date | Feb 15, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2401/90
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention is related to the modifying of substrates with multiple modifying agents in a single continuous system. At least two processing chambers are configured for modifying the substrate in a continuous feed system. The processing chambers can be substantially isolated from one another by interstitial seals. Additionally, the two processing chambers can be substantially isolated from the surrounding atmosphere by end seals. Optionally, expansion chambers can be used to separate the seals from the processing chambers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.