Method of producing a sputtering target

US6652806B2 · kind B2 · utility

Assignee

• RICOH COMPANY, LTD. · JP

Inventors

• Yukio Ide · Mishima, JP
• Hiroko Iwasaki · Tokyo, JP
• Yoshiyuki Kageyama · Tokushima, JP
• Yujiro Kaneko · Tokyo, JP
• Katsuyuki Yamada · Mishima, JP
• Michiaki Shinotsuka · Hiratsuka, JP
• Makoto Harigaya · Hiratsuka, JP
• Hiroshi Deguchi · Yokohama, JP

Key dates

• Filing date: Sep 19, 2001
• Grant date: Nov 25, 2003
• Expiry date: Sep 19, 2021

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/115
• WIPO field: Audio-visual technology
• WIPO sector: Electrical engineering

Abstract

A sputtering target contains a target material including as constituent elements Ag, In, Te and Sb with the respective atomic percents (atom. %) of &agr;, &bgr;, &ggr; and &dgr; thereof being in the relationship of 0.5&lE;&agr;<8, 5&lE;&bgr;&lE;23, 17&lE;&ggr;&lE;38, 32&lE;&dgr;&lE;73, &agr;&lE;&bgr;, and &agr;+&bgr;+&ggr;+&dgr;=100, and a method of producing the above sputtering target is provided. An optical recording medium includes a recording layer containing a phase-change recording material which includes as constituent elements Ag, In, Te and Sb with the respective atomic percents of &agr;, &bgr;, &ggr; and &dgr; thereof being in the relationship of 1&lE;&agr;<6, 7&lE;&bgr;&lE;20, 20&lE;&ggr;&lE;35, 35&lE;&dgr;&lE;70, and &agr;+&bgr;+&ggr;+&dgr;=100, and is capable of recording and erasing information by utilizing the phase change of the recording material in the recording layer. A method of forming the above recording layer for the optical recording medium is also provided. In addition, there is provided an optical recording method using the above-mentioned phase-change optical recording medium.