Process for patterning non-photoimagable ceramic tape
US6653056B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 9, 2001 |
| Grant date | Nov 25, 2003 |
| Priority date | — |
| Expiry date | Oct 20, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/0786
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The invention is directed to a process for patterning ceramic tape wherein a photoresist is applied to a ceramic tape, which enables the photoresist, after being exposed patternwise, and developed, to act as a development mask for the tape. The tape then undergoes a development stage, which ultimately removes undesired sections of tape. The tape contains polymeric binder(s) with acidic or alkaline functional pendant groups but not photosensitive ingredients. Therefore, the tape is aqueous processable but itself cannot be photoimaged. However, when this tape is used with conventional photoresists that have the development chemistry opposite from that of the tape, it allows the photoresist to be used as a development barrier layer for the tape.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.