Process for preparing polymer compound for resist
US6653418B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 16, 2002 |
| Grant date | Nov 25, 2003 |
| Priority date | — |
| Expiry date | Aug 16, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F12/22
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
There is provided a process for preparing a polymer compound for a resist, which can improve the performance, such as the heat resistance, sensitivity and resolution of the resist, without causing film loss of the resist, line width reduction of the resist or deterioration of the dry etching resistance of the polymer. This process comprises dissolving a styrene-based monomer containing at least a 4-acetoxystyrene monomer, and a dimethyl-2,2′-azobiscarboxylate ester in a solvent, thereby to polymerize the styrene-based monomer; adding an alkali catalyst to the resulting polymer solution, thereby to hydrolyze the polymer solution; and washing the resulting polymer compound with water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.