Method and device for wavefront optical analysis
US6653613B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 24, 2000 |
| Grant date | Nov 25, 2003 |
| Priority date | — |
| Expiry date | Mar 24, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J9/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and device for measuring optical wavefront shape parameters based on line-by-line analysis of the wavefront are disclosed. The method comprises at least one step (ACQi) consisting of acquiring a wavefront line. The acquisition comprises detecting (DETi) the line for delivering an electric signal characterizing it, for example, by means of a detection module including, in particular, an array of microlenses and a sensor, the module capable of being mobile in rotation and/or in translation. The acquisition comprises a step (Tsi) for processing the signal for determining a set Ki of parameters, for example, values proportional to the wavefront phase values measured on the line. In an embodiment, the method further comprises a step (RECi) for reconstructing each wave line consisting, for example, in expressing the line phase on a base of orthogonal polynomials, then a step (RECs) for reconstructing the wavefront on the basis of the reconstructed lines. The method and apparatus are applicable in laboratories and industry, for example, for characterizing optical components or systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.