Method for producing a pattern on a transparent substrate
US6656665B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 20, 2000 |
| Grant date | Dec 2, 2003 |
| Priority date | — |
| Expiry date | Mar 13, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24901
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The invention concerns a method for producing a pattern on a transparent substrate, particularly a glass or glass-ceramic substrate.According to the invention, there is deposited on at least one area of one face of the substrate, a first layer of a photosensitive resin comprising at least one sensitizing agent and at least one photosensitive compound essentially composed of a polymer with an average degree of cross-linking d° such that it is able to absorb solid particles. Certain areas of said first layer are exposed to light, particularly in order to increase, in a controlled manner, the average degree of cross-linking do of said polymer so as to modulate its absorption capacity. On the first layer is deposited at least one second layer of a mineral-particle-based composition. The substrate is subjected to at least one treatment cycle, particularly in order to fix said mineral particles.The invention also concerns the substrate produced by this method and its applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.