Method for cleaning etcher parts
US6656894B2 · kind B2 · utility
9Cited by
3References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2000 |
| Grant date | Dec 2, 2003 |
| Priority date | — |
| Expiry date | Dec 8, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/46
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The invention relates to a method useful in removing etch residue from etcher equipment parts. The compositions used are aqueous, acidic compositions containing flouride and polar, organic solvents. The compositions are free of glycols and hydroxyl amine and have a low surface tension and viscosity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.