Ultraviolet lamp system and methods
US6657206B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 4, 2001 |
| Grant date | Dec 2, 2003 |
| Priority date | — |
| Expiry date | Jan 11, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J65/044
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ultraviolet radiation generating system and methods is disclosed for treating a coating on a substrate, such as a coating on a fiber optic cable. The system comprises a microwave chamber having one or more ports capable of permitting the substrate to travel within or through a processing space of the microwave chamber. A microwave generator is coupled to the microwave chamber for exciting a longitudinally-extending plasma lamp mounted within the processing space of the microwave chamber. The plasma lamp emits ultraviolet radiation for irradiating the substrate in the processing space. A pair of reflectors are mounted within the processing space of the microwave chamber. The reflectors are capable of reflecting a significant portion of the ultraviolet radiation to irradiate the backside of the substrate in a surrounding and uniform fashion. When the system is operating, the microwave chamber is substantially closed to emission of microwave energy and ultraviolet radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.