Interface texturing for light-emitting device
US6661028B2 · kind B2 · utility
46Cited by
7References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 14, 2002 |
| Grant date | Dec 9, 2003 |
| Priority date | — |
| Expiry date | May 14, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S257/918
Abstract
The present invention discloses a light-emitting device (LED) with a textured interface formed by utilizing holographic lithography. Two coherent light beams are overlaid to cause constructive and destructive interference and thereby periodical alternative bright and dark lines are formed. A wafer coated with a photoresist material is exposed under the interference lines. After a developing step, a photoresist pattern with textured surface is formed on the wafer. Thereafter, the textured photoresist pattern is transferred to the wafer by etching process and result in a desired light-emitting device with a textured interface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.