Monolithic nozzle assembly formed with mono-crystalline silicon wafer and method for manufacturing the same
US6663231B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 23, 2001 |
| Grant date | Dec 16, 2003 |
| Priority date | — |
| Expiry date | Mar 1, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2/1642
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A monolithic nozzle assembly formed with a mono-crystalline silicon substrate includes a damper for temporarily storing an incoming fluid, and a nozzle having a pyramidal portion and an outlet portion, the pyramidal portion for guiding the flow of the fluid from the damper toward the outlet portion and for increasing the pressure of the fluid, and the outlet portion through which the fluid is discharged, wherein the damper, and the pyramidal and outlet portions of the nozzle are aligned with each other and formed in the single mono-crystalline silicon substrate by continuous processes. The monolithic nozzle assembly can be formed with a single (100) mono-crystalline silicon wafer. Compared with a complicated nozzle assembly formed using a great number of silicon wafers and plates, the configuration of the monolithic nozzle assembly is simple, and can be manufactured on a mass production scale by semiconductor manufacturing processes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.