Patent · US Expired

Complaint membrane for restraining a workpiece and applying uniform pressure during lapping to improve flatness control

US6663477B1 · kind B1 · utility

6Cited by
15References
12Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMay 11, 2000
Grant dateDec 16, 2003
Priority date
Expiry dateMay 28, 2020

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24B37/30
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A lapping process fixture has a base with a mounting surface and a membrane on the mounting surface for supporting a workpiece. The membrane is bonded to the mounting surface and has adhesive on its outer surface such that the workpiece adheres to it. The membrane extends across and seals an opening to a cavity inside the base. The cavity is filled with fluid that may be sealed or externally pressurized through ports in the base. The fixture restrains the workpiece to minimize distortion of its surface during processing. The workpiece is restrained from normal-directed movement by fluidic pressure such that the normal force is uniformly distributed across the surface area of the workpiece. The external adhesive on the membrane restrains the workpiece from tangential movement.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.