Patent · US Expired

Aqueous dispersions, process for their production, and their use

US6663683B2 · kind B2 · utility

24Cited by
4References
28Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 1, 2001
Grant dateDec 16, 2003
Priority date
Expiry dateDec 27, 2021

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31993
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

An aqueous dispersion containing a cerium oxide-doped, pyrogenically produced silicon dioxide, wherein the cerium oxide is introduced through an aerosol of a cerium salt solution or suspension and the average particle size in the dispersion is less than 100 nm. The dispersion is produced by dispersing the cerium oxide-doped, pyrogenically produced silicon dioxide in aqueous solution by means of a high energy input. The aqueous dispersion can be used for chemical-mechanical polishing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.