Aqueous dispersions, process for their production, and their use
US6663683B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 1, 2001 |
| Grant date | Dec 16, 2003 |
| Priority date | — |
| Expiry date | Dec 27, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31993
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An aqueous dispersion containing a cerium oxide-doped, pyrogenically produced silicon dioxide, wherein the cerium oxide is introduced through an aerosol of a cerium salt solution or suspension and the average particle size in the dispersion is less than 100 nm. The dispersion is produced by dispersing the cerium oxide-doped, pyrogenically produced silicon dioxide in aqueous solution by means of a high energy input. The aqueous dispersion can be used for chemical-mechanical polishing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.