Plasma polymerizing apparatus having an electrode with a lot of uniform edges
US6666923B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 18, 2000 |
| Grant date | Dec 23, 2003 |
| Priority date | — |
| Expiry date | Aug 18, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3382
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention relates to a plasma polymerizing apparatus comprises a polymerizing chamber polymerizing surface of substrates by high voltage discharge, a discharge electrode installed inside of the polymerizing chamber, an opposite electrode having a plurality of uniform edges in order to get electric field be formed uniformly on the surface of the electrode, a high voltage applying unit applying the high voltage to the electrode, a gas providing unit providing monomer gas and non-monomer gas inside of the polymerizing chamber, and a pumping unit keeping vacuum inside of the chamber. The present invention can keep the uniformity of the electrode, accordingly the high quality polymerizing film can be fabricated by keeping the uniformity of the current density, carbonation on the each part of the electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.