Method for controlling a refractive index of a dry plating film and method for making a dry plating built-up film
US6666958B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 28, 1999 |
| Grant date | Dec 23, 2003 |
| Priority date | — |
| Expiry date | Sep 28, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/548
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for making a dry plating built-up film comprises providing silicon carbide as a starting source and subjecting to dry plating while changing a concentration of a reactive gas continuously or intermittently to deposit and form, on a substrate, a thin film having different refractive indices along its thickness. A method for making a sputter built-up film is also described, which comprising providing silicon carbide as a target and subjecting to sputtering while changing making electric power against the target continuously or intermittently to deposit and form a thin film having different refractive indices along its thickness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.