Low residue aqueous hard surface cleaning and disinfecting compositions
US6667289B2 · kind B2 · utility
15Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 19, 2001 |
| Grant date | Dec 23, 2003 |
| Priority date | — |
| Expiry date | Jun 21, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D1/75
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Aqueous based cleaning compositions simultaneously featuring low residue deposition, sanitization and/or disinfecting of treated hard surfaces, and good cleaning characteristics are provided. The compositions include the following ingredients: (a) a quaternary ammonium surfactant compound having germicidal properties; (b) a surfactant system which includes at least one amine oxide surfactant and at least one further surfactant selected from carboxylates and N-acyl amino acid surfactants; (c) a solvent system containing an alkylene glycol ether solvent further with a C1-C6 alcohol; (d) an alkalizing agent; and (e) water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.