Patent · US Expired

Scanning probe system with spring probe

US6668628B2 · kind B2 · utility

30Cited by
13References
39Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 29, 2002
Grant dateDec 30, 2003
Priority date
Expiry dateMar 29, 2022

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/873
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Scanning probe systems, which include scanning probe microscopes (SPMs), atomic force microscope (AFMs), or profilometers, are disclosed that use cantilevered spring (e.g., stressy metal) probes formed on transparent substrates. When released, a free end bends away from the substrate to form the cantilevered spring probe, which has an in-plane or out-of-plane tip at its free end. The spring probe is mounted in a scanning probe system and is used to scan or otherwise probe a substrate surface. A laser beam is directed through the transparent substrate onto the probe to measure tip movement during scanning or probing. Other detection schemes can also be used (e.g., interferometry, capacitive, piezoresistive). The probes are used for topography, electrical, optical and thermal measurements. The probes also allow an SPM to operate as a depth gauge.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.