Method of treating an anti-reflective coating on a substrate
US6669995B1 · kind B1 · utility
4Cited by
9References
33Claims
0Family size
Inventors
Key dates
| Filing date | Oct 12, 1994 |
| Grant date | Dec 30, 2003 |
| Priority date | — |
| Expiry date | Oct 12, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0276
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of treating an anti-reflective coating on a substrate. The method includes exposing the anti-reflective coating to a dosage of ultraviolet radiation sufficient to result in the direct removal of at least a portion of the exposed anti-reflective coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.