Reflector with a resistant surface
US6670045B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 10, 2000 |
| Grant date | Dec 30, 2003 |
| Priority date | — |
| Expiry date | May 10, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31681
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reflector, with high total reflection, resisting mechanical stress, and having a reflector body on which the following components are superimposed (a) a functional coating, e.g., a varnish, (b) a reflection layer structure composed of a reflecting metallic layer and, optionally, one or more transparent ceramic layers, having for instance an optical depth of &lgr;/2, applied on the top of the metallic layer. The reflection layer structure is a protection layer as a surface layer. The protection layer is a silicon oxide of general formula SiOx where x is a number from 1.1 to 2.0, or is an aluminum oxide of formula Al2O3, with a thickness of 3nm or more. The protection layer protects the underlying layers from mechanical stresses. In the DIN 58196 wipe test, the protected layer shows no damage after 50 test cycles, each with 100 wiping strokes. These reflectors are useful in the field of lighting and illumination where they can be used for lighting of display units with screens, primary lighting, secondary lighting, raster lighting, light ceilings or light deflector lamella.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.