Patent · US Expired

Laser beam homogenizer

US6672739B1 · kind B1 · utility

15Cited by
3References
40Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 30, 1999
Grant dateJan 6, 2004
Priority date
Expiry dateAug 30, 2019

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/951
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An apparatus, system, and method for illuminating a lithographic mask or an object in a microscope is presented, whereby the output of a laser beam homogenizer is imaged on to a field such as the object plane for lithographic application or on to the rear focal plane of an epi illuminating objective lens as a source for wide field illumination at an object plane in a microscope (for application to magnified imaging of weak phase objects)., and the image of the output is dithered with respect to the field

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.