Surface modification using hydridosilanes to prepare monolayers
US6673459B2 · kind B2 · utility
3Cited by
9References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 3, 2003 |
| Grant date | Jan 6, 2004 |
| Priority date | — |
| Expiry date | Jan 3, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of modifying a surface is disclosed. The method includes contacting the surface with a hydridosilane under conditions and for a time sufficient to form a covalent bond between a silicon atom of the hydridosilane and the oxygen atom of a hydroxyl group on the surface. The hydridosilane has the formula where at least one of Ra, Rb, Rc, and Rd is H, and at least one of Ra, Rb, Rc, and Rd is not H.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.