Patent · US Expired

Aqueous dispersion, a process for the preparation and the use thereof

US6676719B2 · kind B2 · utility

33Cited by
3References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 21, 2001
Grant dateJan 13, 2004
Priority date
Expiry dateDec 21, 2021

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2006/80
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

A pyrogenic process is used to prepare alkali-doped silica particles. Particles produced by this process exhibit homogeneous doping, reduced agglomeration, greater stability and higher removal rates. Aqueous dispersions containing alkali-doped pyrogenic silica with average particle size less than 100 nm are used for polishing surfaces (CMP).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.