Device and method for fabricating diffractive gratings
US6676846B2 · kind B2 · utility
0Cited by
7References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 9, 2003 |
| Grant date | Jan 13, 2004 |
| Priority date | — |
| Expiry date | Jan 9, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/1857
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is provided a grating fabrication device and method to form gratings on a semiconductor substrate. The substrate is loaded into a reactor filled with an etchant solution, and an array of parallel light of interference light with different periods is projected onto the substrate to etch the portion of the substrate that is exposed to the light via an oxidation-reduction reaction. At the same time, the inclination angle of the substrate is selectively varied to obtain the different grating periods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.