Microwave enhanced CVD method and apparatus
US6677001B1 · kind B1 · utility
0Cited by
22References
43Claims
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Key dates
| Filing date | Jun 6, 1995 |
| Grant date | Jan 13, 2004 |
| Priority date | — |
| Expiry date | Jun 5, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32678
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A new chemical vapor reaction system is described. Instead of ECR where electrons can move as independent particles without interaction, a mixed cyclotron resonance is a main exciting principal for chemical vapor reaction. In the new proposed resonance, the resonating space is comparatively large so that a material having a high melting point such as diamond can be deposited in the form of a thin film by this inovative method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.