Method and equipment for using photo- or thermally imagable, negatively working patterning compositions
US6677106B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 3, 2002 |
| Grant date | Jan 13, 2004 |
| Priority date | — |
| Expiry date | Jun 28, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for imaging patterning compositions comprising the steps of:(1) providing at least one patterning composition layer on a substrate; said patterning composition comprising:(a) at least one acid generator;(b) at least one cross linking resin or compound;(c) at least one binder resin comprising a polymer containing reactive pendant group selected from group consisting of hydroxyl, carboxylic acid, sulfonamide, active imide, alkoxymethylamides and mixtures thereof; and(d) at least one infrared absorber;(2) imagewise exposing the patterning composition layer to actinic radiation;(3) treating the imaged patterning composition layer with heat energy to treat the imaged portions of the composition layer;(4) flood exposing the heat-treated, imaged patterning composition layer with UV light for a predetermined time, said time being sufficient to promote the effective clear-out of non-imaged portions during the developing step without causing substantial deterioration of the imaged portions; and(5) developing the flood exposed, heat-treated imaged patterning composition with an aqueous alkaline developer to remove the non-imaged areas of the patterning composition layer and leaving t…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.