Method of calibrating the optical system of a laser machine for processing electrical circuit substrates

US6678061B2 · kind B2 · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Alexander Kilthau · Bad Schönborn, DE
• Andre Kletti · Sandhausen, DE
• Hans Juergen Mayer · Viernheim, DE
• Eddy Roelants · Brugge, BE

Key dates

• Filing date: Apr 15, 2002
• Grant date: Jan 13, 2004
• Expiry date: Apr 15, 2022

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05K3/0026
• WIPO field: Machine tools
• WIPO sector: Mechanical engineering

Abstract

To calibrate the optical system of a laser machine having a laser source, a deflecting unit and an imaging unit, firstly a first sample plate is arranged in the focal plane of the imaging unit, with prescribed grid points being marked by the laser beam. After that, the marked points are measured by means of a camera, and their position values are compared with the prescribed position values of the target points, in order to derive first correction values from this and store them. After that, a second sample plate is arranged in a second calibrating plane, at a distance from the focal plane, and is targeted by the laser beam and provided with markings. The second sample plate is measured by the camera, and the measured positions of the markings are compared with the positions of the target points, in order to derive second correction values and store them. From the stored first and second correction values of the two planes, correction values can then be determined by interpolation for arbitrary target points in the spatial region between the focal plane and the second calibrating plane and be used for the activation of the deflecting unit.