High aspect ratio patterning of glass film
US6678453B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2002 |
| Grant date | Jan 13, 2004 |
| Priority date | — |
| Expiry date | Apr 24, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12038
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A relatively facile, inexpensive method for patterning a layer of glass or a substrate involves patterning a seed material containing a nucleating agent adjacent a layer of thermally crystallizable glass and heat treating the seed material and the layer of thermally crystallizable glass to induce highly oriented crystal growth from the seed material through the thickness of the thermally crystallizable glass layer at selected portions thereof. After the heat treatment, the layer of thermally crystallizable glass is converted into a desired pattern of glass surrounded by crystalline material. The crystalline material is removed with an etchant to leave a desired glass pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.