Method of making self-cleaning substrates
US6679978B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2002 |
| Grant date | Jan 20, 2004 |
| Priority date | — |
| Expiry date | Mar 8, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2217/71
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A photocatalytically-assisted self-cleaning (“PASC”) coating on a substrate enables the substrate to shed dirt simply by rinsing with water. A method of making a PASC coating includes depositing by chemical vapor deposition an alkali metal diffusion barrier layer on a substrate; sputtering an ultraviolet radiation activated layer on the alkali metal diffusion barrier layer at a temperature of 100° C. or less; and, without heating above 100° C., exposing the ultraviolet radiation activated layer to ultraviolet radiation to form the self-cleaning substrate. The sputter deposition of the ultraviolet radiation activated layer on the chemical vapor deposited alkali metal diffusion barrier layer allows the ultraviolet radiation activated layer to be activated upon exposure to UV radiation without first having been heated during and/or after deposition. The elimination of this step of heating the ultraviolet radiation activated layer results in significant process simplification and cost reduction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.