Uniform gas distribution in large area plasma source
US6682630B1 · kind B1 · utility
27Cited by
5References
45Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2002 |
| Grant date | Jan 27, 2004 |
| Priority date | — |
| Expiry date | Mar 29, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus configured to generate a time-varying magnetic field through a field admission window of a plasma processing chamber to create or sustain a plasma within the chamber by inductive coupling. The apparatus includes a magnetic core presenting a pole face structure,—an inductor means associated with the magnetic core, arranged to generate a time-varying magnetic field through the pole face structure, and—a device for injecting gas into the chamber and through the chamber and through the magnetic core.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.