Plasma source for spectrometry
US6683272B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 31, 2002 |
| Grant date | Jan 27, 2004 |
| Priority date | — |
| Expiry date | Dec 31, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4622
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma source for a spectrometer for spectrochemical analysis of a sample is characterized by use of the magnetic field component of applied microwave energy for exciting a plasma. The source includes a waveguide cavity (10) fed with TE10 mode microwave power. A plasma torch (16) passes through the cavity (10) and is axially aligned with a magnetic field maximum (18) of the applied microwave electromagnetic field. Magnetic field concentration structures such as triangular section metal bars (20) may be provided. In an alternative embodiment a resonant iris may be provided within a waveguide and the plasma torch positioned relative thereto such that the microwave electromagnetic field at the resonant iris excites the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.