System and method for irradiation with improved dosage uniformity
US6683319B1 · kind B1 · utility
12Cited by
88References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 16, 2002 |
| Grant date | Jan 27, 2004 |
| Priority date | — |
| Expiry date | Jul 16, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K5/10
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A system and method for providing irradiation to material shapes an electron beam into a profile having a substantially rectangular intensity distribution. The profile is deflected onto the material in a pattern with substantial overlap in a first dimension and without substantial overlap in a second dimension. In an exemplary embodiment, irradiation is provided to the material from first and second opposite sides.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.