Reflector, sidelight type backlighting apparatus and reflector substrate
US6683720B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 13, 2002 |
| Grant date | Jan 27, 2004 |
| Priority date | — |
| Expiry date | Aug 13, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/0055
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An object of the invention is to provide a sidelight type backlighting apparatus having high brightness, which is yet reduced in uneven brightness, and to provide a reflector substrate having a surface profile necessary for obtaining such apparatus and a reflector having high brightness and long durability in which the reflector substrate is implemented. A buffer against strain is formed by providing space by protrusions or the like between a light guiding plate of a planar light source apparatus and a reflecting surface of a reflection sheet provided on one main surface of the light guiding plate. Further, a base layer, a metallic layer mainly containing silver, and a light transmitting oxide layer are laminated on the substrate in this order to form a reflection layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.