Method and apparatus for three-dimensional modeling
US6685866B2 · kind B2 · utility
161Cited by
13References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 9, 2001 |
| Grant date | Feb 3, 2004 |
| Priority date | — |
| Expiry date | Aug 1, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49826
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Disclosed are an apparatus and method for three-dimensional deposition modeling, which shield a supply of modeling filament fed through a deposition modeling machine from exposure to environmental moisture. Dry gas under pressure is supplied to a filament path leading from a material supply to a liquifier, creating an active moisture barrier along the filament path. In a preferred embodiment, an entrance of the filament path is configured to seal to an exit orifice of a cassette containing the material supply, and an exit of the filament path is vented to release exhaust gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.