Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate
US6686126B2 · kind B2 · utility
2Cited by
7References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2001 |
| Grant date | Feb 3, 2004 |
| Priority date | — |
| Expiry date | Jul 11, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0295
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A plate-making method of a lithographic printing plate is disclosed, which comprises the steps of exposure of a photo-sensitive lithographic printing plate having the acid value of a photosensitive layer of 1.0 meq/g or less with a laser beam, and then development with a developing solution having a pH value of 13.0 or less at a developing speed in an unexposed domain of 0.05 &mgr;m/s or more and at an osmotic speed of a developing solution in an exposed domain of 0.1 &mgr;m/s or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.