On-line UV-Visible light halogen gas analyzer for semiconductor processing effluent monitoring
US6686594B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 29, 2001 |
| Grant date | Feb 3, 2004 |
| Priority date | — |
| Expiry date | Mar 27, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/33
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An on-line halogen analyzer system and method of use for semiconductor processing effluent monitoring. The system includes sampling the effluent stream into an absorption cell, and passing UV-Visible light through the effluent sample in the cell. After passing through the sample the light is collected by a photo detector for real-time wavelength-selective absorption analysis. The system provides simultaneous determination of the concentrations of multiple halogen gases (e.g. F2, Cl2, Br2, and I2) in semiconductor processing effluent streams. The invention can be used for chemical vapor deposition (CVD) chamber cleaning endpoint determination and to improve fluorine utilization efficiency in remote plasma downstream CVD chamber cleaning processes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.