Numerical aperature increasing lens (nail) techniques for high-resolution sub-surface imaging
US6687058B1 · kind B1 · utility
10Cited by
5References
52Claims
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Key dates
| Filing date | Dec 20, 2001 |
| Grant date | Feb 3, 2004 |
| Priority date | — |
| Expiry date | Dec 20, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2007/13727
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A viewing enhancement lens (18-NAIL) which functions to increase the numerical aperture or light gathering or focusing power of viewing optics such as a microscope (26) used to view structure within a substrate such as a semiconductor wafer or chip or of imaging optics such as media recorders. The result is to increase the resolution of the system by a factor of between n, and n2, where n is the index of retraction of the lens substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.