Analysis of a composition
US6687520B2 · kind B2 · utility
1Cited by
3References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 11, 2002 |
| Grant date | Feb 3, 2004 |
| Priority date | — |
| Expiry date | Sep 11, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/656
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An analysis apparatus, in particular a spectroscopic analysis apparatus, comprises an excitation system (exs) for emitting an excitation beam (exb) to excite a target region during an excitation period. A monitoring system (lso) is provided for emitting a monitoring beam (irb) to image the target region during a monitoring period. The monitoring period and the excitation period being substantially overlap, so that monitoring the target region is maintained during excitation. The analysis apparatus is provided with a tracking system (osc, dcu) to control the excitation system to direct the excitation beam onto the target region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.