Line generator optical apparatus
US6688758B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 28, 2002 |
| Grant date | Feb 10, 2004 |
| Priority date | — |
| Expiry date | Jun 28, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/0966
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for generating linear patterns of light comprises a light source emitting a first light beam. An anamorphic system is positioned downstream of the light source and is adapted to receive the first light beam of the light source for concentrating the first light beam such that the first light beam would project a first linear pattern on a far field. A diffractive optical element is positioned downstream of the anamorphic system for receiving and diffusing the first light beam of the anamorphic system a plurality of second light beams. The plurality of second light beams overlap one another at least partially so as to project a second linear pattern on the far field of altered intensity with respect to the first linear pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.