Method for measuring diffusion of photogenerated catalyst in chemically amplified resists
US6689529B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 17, 2001 |
| Grant date | Feb 10, 2004 |
| Priority date | — |
| Expiry date | Apr 17, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of imaging acid in a chemically amplified photoresist comprising the steps of: (a) exposing the chemically amplified photoresist to radiation thereby generating an acid, the chemically amplified photoresist comprising at least one species of pH-dependent fluorophore that fluoresces in the presence of the acid, the pH-dependent fluorophore being present at a concentration that enables the fluorescence from individual molecules of the pH-dependent fluorophore to be individually resolved; and (b) generating an image of the acid in the photoresist, the image comprising at least one or a plurality of discrete points corresponding to the fluorescent emission from an individual molecule or molecules of the pH-dependent fluorophore.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.