Polymers and use thereof
US6689540B2 · kind B2 · utility
7Cited by
9References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 9, 2002 |
| Grant date | Feb 10, 2004 |
| Priority date | — |
| Expiry date | Jan 9, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/168
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Compositions comprising a polymer having silicon, germanium and/or tin; and a protecting group grafted onto a polymeric backbone are useful as resists and are sensitive to imaging irradiation while exhibiting enhanced resistance to reactive ion etching.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.