Third harmonic laser system
US6690692B2 · kind B2 · utility
2Cited by
22References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 29, 2002 |
| Grant date | Feb 10, 2004 |
| Priority date | — |
| Expiry date | Jul 29, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/082
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A third harmonic laser system includes a fundamental wave resonator for generating fundamental laser beam, a second harmonic laser generator for converting fundamental laser beam to a second harmonic laser beam, and a third harmonic laser generator for mixing the second harmonic laser beam with the fundamental laser beam so as to produce a third harmonic laser beam. Multi-pass tripling is used for producing the third harmonic laser beam by means of reflecting and polarizing mirrors, and that the outputted third harmonic laser beam has a high efficiency of about 51% and a high power up to 8.6 W.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.